Imagine being asked to locate a grain of salt lying somewhere on a soccer field. That is the level (single digit parts per trillion) to which metallic impurities in Solvay’s INTEROX® Pico Hydrogen Peroxide need to be detected and eliminated. Together with almost equally demanding purity requirements for anionic and organic impurities there are only a few companies in the world able to meet the most exacting requirements of the leading semiconductor manufacturers.
INTEROX® Pico and PicoPlus are two of a range of Electronic Wet Chemicals produced by Solvay’s GBU Special Chem (others include ultra pure Phosphoric Acid & Hydrofluoric Acid). Used primarily in the cleaning and etching stages of semiconductor chip production demand is growing rapidly for these materials as the leading semiconductor manufacturers continue to innovate to keep pace with “Moore’s Law” (doubling the number of transistors on integrated circuits every two years) in a process which drives the continuous performance improvement in all our computers, smart phones and other electronic devices.