Sifren® 46 (C4F6 or Hexafluorobutadiene) C4F6 has a GWP=0 and it is the most advanced etching gas for critical applications. Its low C/F ratio and its insaturations allow achieving the highest aspect ratios in etching. Sifren® 46 (C4F6 or Hexafluoro-1,3-butadiene) is an unsaturated fluorocarbon with an alternating double bond. It is a colorless, odorless, toxic, flammable gas showing very high performance for plasma, ion beam, or sputter etching in semiconductor devices manufacturing with Xenon (Xe) and Argon (Ar) as carrier or dilution gas. Due to the short atmospheric lifetime (


  • CAS number
  • Global Business Unit
    Special Chem
  • Brand
    SIFREN® 46
  • Synonyms


Segments Applications
Process Efficiency Fab Process Material
Enhanced Design & Connectivity Semiconductors & memory

Chemical categories

Chemical category Chemical family Chemical product
Fluorine derivatives Fluorinated Chemicals Hexafluorobutadiene

Region of commercial availability

  • Asia / Pacific
  • Europe / Middle East / Africa
  • North America
  • Latin America

Download documentation for SIFREN® 46