Used for the manufacturing of semiconductor devices, flat panels, photovoltaic panels and MEMS

Sulfur Hexafluoride (SF6) is more and more used for the manufacturing of semiconductor devices such as IC (integrated circuits), flat panels, photovoltaic panels and MEMS (Micro-Electro-Mechanical-Systems). 

SF6 is applied in the above process as an etching gas. Due to the density and large molecule size, SF6 is a preferred etching gas in flat panel and MEMS production processes.

Fluorinated gases, such as Sulfur Hexafluoride (SF6), play very important roles in the manufacturing of silicon devices. 

Gas purity is of key importance in this market segment, because any possibility of contamination has to be minimized. For this purpose Solvay offers N5.0 material (purity min. 99.999 %)