Hyflon® AD amorphous perfluoropolymers can provide uniform and thin films or coatings down to submicron thicknesses for solution process technologies. Important characteristics for microlithography applications include:

  • High temperature stability
  • Good chemical resistance
  • Excellent hydrophobicity
  • Very low surface energy
  • Low dielectric constant
  • Very high gas permeability and selectivity
  • Outstanding optical properties (i.e. high UV transmittance, low refractive index)