Enhanced Solutions for Dry Etching

As the semiconductor industry continuously expands, dry etching remains a crucial process for manufacturers who need to effectively remove unwanted materials from semiconductor components. Dry etching, an eco-friendly alternative to conventional wet etching, refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of ions (usually a plasma of reactive gases) that dislodge portions of the material from the exposed surface. Directed pressure under vacuum conditions allows for optimization by using gas mixtures to create a reaction that affects the wafer surface. Dry etching is a quick process that does not require much operator training. 

Solvay’s innovative polymers enhance dry etching tools, while our extensive portfolio of semiconductor gases improves the dry etching and cleaning process, itself. Our unique dry etching and cleaning solutions offer a variety of performance advantages for effective semiconductor fabrication.


Products for high-Performance Dry Etching 

Solvay’s expansive offering of materials for dry etching and cleaning are revolutionizing the market with polymers for tools and fluids, such as Fomblin® PFPE, Galden® PFPE, Tecnoflon® FKM & PFR FFKM, Ketaspire® PEEK and Torlon® PAI. Our portfolio of semiconductor gases, including Sulfur Hexafluoride (SF6), Sifren® 46, Solvaclean® and Fluorine/Nitrogen (F2/N2) Mixtures, improves the cleaning process with the ability to use pressure on high-performing materials and effectively remove contamination. 

Advanced Polymers and Gases for Dry Etching and Cleaning 

Solvay’s advanced polymers provide solutions for the tools used in the dry etching and dry cleaning process. Our materials are widely utilized to enhance components like vacuum pumps, chillers, chemical transportations, seals, and etching rings. They are made to withstand aggressive chemical and plasma environments under fluctuating temperatures. Our semiconductor gas portfolio offers environmentally friendly solutions, with exceptional gases for dry etching processes.

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