At Solvay, we have a long history of scientific innovation that we continue to build on. That includes working with the highly reactive fluorine gas (F2) to develop products like leading cleaning solution Solvaclean®.
Solvaclean®, which has zero global warming potential (GWP), replaces gasses with extremely high GWP. This includes nitrogen trifluoride (NF3) and sulfur hexafluoride (SF6). It also comprises perfluorocarbons like hexafluoroethane (C2F6) and tetrafluoromethane, (CF4).
A greenhouse gas’ GWP indicates how long the gas stays in the atmosphere, where it traps heat and contributes to global warming. As part of our commitment to sustainability, we focus on developing products with minimal negative impact on the environment. Such as zero-GWP solutions like Solvaclean®.
The innovative Solvaclean® uses a carefully formulated blend of F2, argon (Ar) and nitrogen (N2) to create an effective and environmentally friendly cleaning solution for a range of sectors. The main market is the semiconductor industry, where tool and process chamber cleaning are among its applications. Other important markets are the flat panel and photovoltaic sectors.
Preparing for environmental legislation
Environmental regulations are tightening around the world, increasing pressure on industries and businesses to reduce their carbon footprints. Semiconductor manufacturers are no exception, and the sector will soon face requirements to reduce or completely phase out high-GWP gases.
So, like other markets, the semiconductor industry needs environmentally friendly solutions that don’t contribute to global warming – solutions such as Solvaclean® – more than ever. With its zero GWP, Solvaclean® not only helps semiconductor businesses become more sustainable, but also supports them in preparing for upcoming environmental legislation.
A legacy of knowledge
Solvaclean® is an effective, efficient and energy-saving cleaning solution. The highly reactive nature of its F2 element can present challenges for production, handling, and safety. But, with our decades of accumulated knowledge, we can meet those challenges.
We have worked with fluorine chemistry since 1974: experience that led to the development of Solvaclean®. Safety is our top priority for Solvaclean®, as with all our fluorine-based products. That incorporates everything from its composition to the stringent safety measures and training.
Our extensive expertise of fluorine, and of chemistry more broadly, inspired us to add argon and nitrogen to the mixture. This helps mitigate some of the risks linked to fluorine's reactivity. We designed Solvaclean® for safe and effective use in industrial environments, making sure it doesn’t damage people, equipment, or the environment.
Solvaclean® uses an innovative blend of F2, argon and nitrogen. This ensures it can be used safely and efficiently, without damaging equipment.
Efficient and cost-effective
Solvaclean® integrates easily with manufacturers’ existing cleaning systems. This removes the need to invest in expensive new equipment, and minimizes downtime and operational disruptions. That means the product comes with built-in cost savings, and with an average payback time of less than two years, Solvaclean® provides a quick return on investment* (ROI).
The semiconductor industry uses remote plasma sources to produce the radicals that clean the process chambers. The highly reactive nature of F2 means Solvaclean® allows the plasma sources to run at a lower current, leading to reduced energy consumption. Solvclean®'s efficiency reduces the amount of gas needed per cleaning cycle, resulting in less wastewater generation.
Solvaclean® offers a wide range of benefits, from cost-savings and product efficiency to a fast ROI. Combined with strong sustainability credentials, these characteristics give businesses in the semiconductor, flat panel, photovoltaic and other industries compelling reasons to choose the solution.
* Payback time assumes that CO2 certifications are considered income.
