Tailored to the needs of the electronic industry

Phosphoric Acid is highly selective in etching Si3N4 instead of SiO2. In combination with INTEROX® hydrogen peroxide and water, it is used to etch aluminium and InGaAs selective to InP.

Solvay offers Electronic Grade Phosphoric Acid from its site in Bernburg, Germany. It is tailored to the needs of the electronic industry with a focus on the wet processing steps in the manufacture of semiconductor wafers.